volume 32, issue 21, P1571-1577 1992
DOI: 10.1002/pen.760322105
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Abstract: Abstract t‐Boc protected Deep‐UV transparent polymers with photoacid generators have been widely investigated as potential positive deep‐UV resist systems. However, utility of these systems is seriously handicapped by environmental contaminants leading to an insoluble “surface skin” formation. Only with a specially controlled environment or by use of an “overcoat” material is the performance of these systems acceptable. We have investigated a series of t‐Boc protected poly(styrene‐maleimide) copolymers and po…

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