The amount of under-potential-deposited (UPD) H(ads), if it forms on Cu(111), is small compared to what forms on Pt(111). According to experimental literature, current density on polycrystalline copper increases slowly in the over-potential-deposited (OPD) potential range beginning at 0 V and rises rapidly at several hundred mV negative potential. Using a comprehensive density functional theory for the electrochemical interface, including Fermi level shifts, in this article we attribute this behavior to calculated weak H adsorption which requires the potential to be reduced to ∼0.0 V(SHE) in order for H(ads) deposition to commence. A literature estimate, based on exchange current densities, of the activation energy for H 2 evolution at 0 V is ∼0.32 eV. As the coverage increases with increasingly negative potentials, we calculate the H adsorption energy decreases at a rate 0.27 eV/V for Cu(111), and this will decrease the effective activation energy. We propose that the observed rapid increase in current density at approximately −0.4 V corresponds to ∼0.5 ML coverage by H(ads) and reflects the decreasing activation energy at more negative potentials. We also relate our calculated findings to the literature for electroless copper deposition and to literature for palladium-doped copper as a heterogeneous hydrogenation catalyst. In this article we used quantum theory to explore hydrogen evolution from Cu(111) electrode surfaces. Hydrogen atoms bond weakly to copper surfaces and for significant hydrogen evolution to take place, an overpotential relative to the 0.0 V standard reversible potential must be applied. The first step is deposition of H(ads). In acidic electrolyte the reaction isand in alkaline electrolyteThere are additional ways in which hydrogen can be introduced to copper surfaces as H(ads). In alkaline electrolytes hydrogen is evolved from copper surfaces when aldehyde groups are oxidized without potential control in alkaline electrolyte, that is at the potentials of zero charge (PZC), during electroless copper deposition. [1][2][3][4] In this case the goal is depositing copper atoms on selected substrates and H 2 , formed from combination of H(ads) on copper, 4 is a secondary product. Hydrogen can also be introduced to copper surfaces as H(ads) by spillover of H bonded to Pd atoms on the copper surface. [5][6][7] In this case H 2 dissociation is activated by the Pd ad-atom and the weakly held spilled-over H(ads) performs hydrogenation of organic molecules.To reduce water to hydrogen in alkaline electrolytes over copper electrodes requires high overpotentials of around 0.2 V. 8,9 This contrasts with the small overpotential over platinum. Exchange current densities for hydrogen evolution in alkaline electrolyte for several transition metals, including copper, have been correlated to theoretically calculated H 2 (g) chemisorption energies in a volcano plot. 9 In the plot Pt is near the peak on the left hand side and Pd, Fe, Ni, Co, and W were also on the left (too strongly adsorbed) and Cu, Au, and Ag wer...