33.1: A 3.2-in. LCD Panel using Amorphous Silicon TFT Formed with Novel Selective and Dispersive Transfer Technique

Abstract

A novel formation process for TFT using our proposed novel selective transfer technique, which enables low cost TFT fabrication on a large and flexible substrate, is proposed. This technique is used to fabricate a 3.2-inch LCD Panel using amorphous silicon TFT transferred on glass substrate for the first time.