2015 Symposium on VLSI Technology (VLSI Technology) 2015
DOI: 10.1109/vlsit.2015.7223680
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30-nm-channel-length c-axis aligned crystalline In-Ga-Zn-O transistors with low off-state leakage current and steep subthreshold characteristics

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Cited by 31 publications
(19 citation statements)
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“…In contrast, polycrystalline semiconductors have a negative impact on TFT behaviour depending on the crystal size and channel length. IGZO TFTs with channels as short as 30 nm have already been demonstrated for transistors fabricated in the back-end-of-line of conventional silicon CMOS chip technology 9 . Moreover, organic transistors are widely studied as a potential candidate for flexible ICs to complement n-type metal-oxide TFTs 10 , because p-type metal-oxides matching the performance of amorphous IGZO have not yet been discovered.…”
Section: Nature Electronicsmentioning
confidence: 99%
“…In contrast, polycrystalline semiconductors have a negative impact on TFT behaviour depending on the crystal size and channel length. IGZO TFTs with channels as short as 30 nm have already been demonstrated for transistors fabricated in the back-end-of-line of conventional silicon CMOS chip technology 9 . Moreover, organic transistors are widely studied as a potential candidate for flexible ICs to complement n-type metal-oxide TFTs 10 , because p-type metal-oxides matching the performance of amorphous IGZO have not yet been discovered.…”
Section: Nature Electronicsmentioning
confidence: 99%
“…An OS FET with an active layer comprising CAAC-IGZO is ideally suited for use as a minute FET because it is less likely to be affected by the short-channel effect. Thus, the OS FET can also be used for large-scale integrated circuits [24][25][26][27]. Figure 1 shows the I D -V G characteristics of a transistor with W/L of 60 nm/60 nm.…”
Section: Characteristics Of Caac-igzomentioning
confidence: 99%
“…In addition, CAAC-IGZO FETs are less likely to suffer from short-channel effects, which makes them suitable for scaling [21,22]. Due to this effect, the application of CAAC-IGZO to LSI devices, e.g., memories, as well as to displays, has also been proposed [22][23][24][25].…”
Section: Introductionmentioning
confidence: 99%
“…In addition, CAAC-IGZO FETs are less likely to suffer from short-channel effects, which makes them suitable for scaling [21,22]. Due to this effect, the application of CAAC-IGZO to LSI devices, e.g., memories, as well as to displays, has also been proposed [22][23][24][25]. As an example, we have fabricated a memory which includes CAAC-IGZO FETs stacked over a circuit comprising silicon FETs, which has indicated that stacking can prove to be effective for a high integration of circuits [23,24].…”
Section: Introductionmentioning
confidence: 99%