We present an overview of SERIS' monoPoly technology on screen-printed, M2-size (244.4 cm 2 ) n-type bifacial silicon solar cells with a rear n + :poly-Si/SiO x passivating contact stack, where the SiO x and n + :poly-Si layers are fabricated by single-side inline plasma-enhanced chemical vapour deposition (PECVD). We demonstrate the application of these stacks on thin ($110 μm) silicon wafers, giving an excellent open-circuit voltage of 707 mV and an externally verified cell efficiency of 23.2% using commercial screen-printed and fire-through metal pastes. A detailed power analysis is presented, with a breakdown of the voltage and current losses. Finally, we share the progress on standard wafers with an efficiency of 23.8% achieved and present the outlook for this technology with a selective passivating contact stack at the front and a full-area passivating contact stack at the rear.