ac.jp wr present the result of applicatien of an etch-stop technique in the cliip level fabrication process in order to improve the button flatness and depth variation of bu]k micromachined cavities. The chips will be used in micro mirror manipulator device as an optical switch in a multi-input multi-output scheme, In order to inerease the process yield. we tried to use a 1pm Silicon Nitride membrane as an etch-stop [ayer and pattern carrying membrane to increase the process yield in the batch fabrication stage.