Nb-doped Ti2O3 Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis

Abstract

Niobium doped dititanium trioxide (Ti 2 O 3 :Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti 2 O 3 :Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of Ti 2 O 3. No niobium oxide Nb x O y peaks were observed, which indicates that niobium oxide if formed, is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It was observed that "as-deposited" Ti 2 O 3 :Nb films (without post annealing) are transparent and electrical conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable thickness of the film and a miminum resistivity of 2x10-2 Ω.cm which indicates that there is potential for application as Transparent Conductive Oxide (TCO).

Heteroatom Modified TiO2/Graphene Aerogel Composites by Electron Beam Irradiation in Supercapacitors

“…After irradiation, NT-NSG-X (X = 70, 140, 210, 280) presents a new diffraction broad peak at around 2θ = 23°, corresponding to the (012) crystal surface of the tripartite crystalline system Ti 2 O 3 (JCPDS: No. 43-1033), indicating the production of Ti 3+ . At the same time, the intensity of the main diffraction peak of anatase TiO 2 tends to decrease after irradiation, indicating that the content of Ti 4+ in the material decreases.…”

“…The compound graphene aerogel exhibits a folded morphology with TiO 2 -like quantum dots uniformly distributed on its surface, demonstrating effective assembly between TiO 2 -like quantum dots and GO during hydrothermal treatment. Figure S1a− 32 indicating the production of Ti 3+ . At the same time, the intensity of the main diffraction peak of anatase TiO 2 tends to decrease after irradiation, indicating that the content of Ti 4+ in the material decreases.…”

Recent Progress on Titanium Sesquioxide: Fabrication, Properties, and Applications

“…[43,44,51,52] As for the epitaxial Ti 2 O 3 films, several filmgrowth techniques have been used to prepare the samples, including pulsed laser deposition (PLD), [46,49,59] and magnetron sputtering. [60,61] By using epitaxial stabilization, the metastable phases o-Ti 2 O 3 and γ-Ti 2 O 3 , not found in the bulk, can be artificially fabricated as thin films. It should be mentioned that a gold-colored phase of Ti 2 O 3 has been formed at high pressures and temperatures from α-Ti 2 O 3 .…”

Efeito do teor de nióbio na molhabilidade de filmes TiO2:Nb

“…Na Tabela I são apresentados os parâmetros utilizados para a deposição dos filmes, padronizados para todos os ensaios. Essas condições foram as que apresentaram melhor estabilidade do plasma e boa aderência dos filmes, verificados em estudos anteriores [10,11]. Os filmes foram depositados sobre substratos de vidro soda-cal comercial, contendo SiO 2 (72%), Na 2 O (14%), CaO (9%) e balanço de outros compostos [12], com dimensões de 20,0x20,0x4,0 mm.…”