2021
DOI: 10.1088/1361-6439/ac0ff7
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Abstract: In order to achieve high-efficiency and high-precision fabrication of nanochannels in micro/nano-fluidic devices, a new method for integrating nano-imprint lithography manufacturing nano-channels and polydimethylsiloxane (PDMS) microchannels with silicon nitride as a bonding layer is proposed. Nanoimprint technology has the advantages of high-precision replication of the template nano-groove size and the ability to form a large number of channels at one time. By depositing silicon nitride on the surface of the… Show more

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Cited by 6 publications
(1 citation statement)
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“…However, the diffraction limit [16] appears to be an insurmountable obstacle, which hinders the development of the roadmap for semiconductor industry towards smaller devices and motivates researchers to seek other promising lithography techniques. The emergence of lithography technologies, including nanoimprint [17][18][19], electron beams [20][21][22][23][24][25], extreme ultraviolet [26], and scanning probes [27], provide another opportunity for the fabrication of high-resolution micro/nano structures. In view of the complicated procedures and high start-up cost of the above-mentioned technologies, it is difficult to realize more advanced applications in various academic and industrial fields.…”
Section: Introductionmentioning
confidence: 99%
“…However, the diffraction limit [16] appears to be an insurmountable obstacle, which hinders the development of the roadmap for semiconductor industry towards smaller devices and motivates researchers to seek other promising lithography techniques. The emergence of lithography technologies, including nanoimprint [17][18][19], electron beams [20][21][22][23][24][25], extreme ultraviolet [26], and scanning probes [27], provide another opportunity for the fabrication of high-resolution micro/nano structures. In view of the complicated procedures and high start-up cost of the above-mentioned technologies, it is difficult to realize more advanced applications in various academic and industrial fields.…”
Section: Introductionmentioning
confidence: 99%