Controlled Modification of Protein-Repelling Self-Assembled Monolayers by Ultraviolet Light: The Effect of the Wavelength

Jeyachandran, Y.L.; Terfort, Andreas; Zharnikov, Michael

doi:10.1021/jp300436n

Cited by 31 publications

(126 citation statements)

References 42 publications

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“…[19][20][21] UV-light is known to accelerate this degradation. 22,23 Dendritic polyglycerols (PGs) have been shown previously to resist protein adsorption. 24 Their high biocompatibility was demonstrated in both in vivo and in vitro assays.…”

Section: Introductionmentioning

confidence: 99%

Fouling-Release Properties of Dendritic Polyglycerols against Marine Diatoms

Wanka

Finlay

Nolte

et al. 2018

ACS Appl. Mater. Interfaces

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Dendritic polyglycerols (PGs) were grafted onto surfaces using a ring-opening polymerization reaction and the fouling-release properties against marine organisms were determined. The coatings were characterized by spectroscopic ellipsometry, contact angle goniometry, ATR-FTIR and stability tests in different aqueous media. A high resistance towards the attachment of different proteins was found. The PG coatings with three different thicknesses were tested in a laboratory assay against the diatom Navicula incerta and in a field assay using a rotating disk. Under static conditions, the PG coatings did not inhibit the initial attachment of diatoms, but up to 94 % of attached diatoms could be removed from the coatings after exposure to a shear stress of 19 Pa.Fouling-release was found to be enhanced if the coatings were sufficiently thick. The excellent fouling-release properties were supported in dynamic field-immersion experiments in which the samples were continually exposed to a shear stress of 0.18 Pa.

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Section: Introductionmentioning

confidence: 99%

Fouling-Release Properties of Dendritic Polyglycerols against Marine Diatoms

Wanka

Finlay

Nolte

et al. 2018

ACS Appl. Mater. Interfaces

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“…Interestingly, the exposure of closely related, PEG-substituted self-assembled monolayers (SAMs) to UV light results in the same effect as their exposure to electrons, viz. a decomposition of the PEG moieties and their chemical modification, accompanied by a depletion of oxygen [ 35 , 36 , 37 ]. The most likely mechanism behind this behavior in the UV case is the effect of so-called “hot” electrons originating from the substrate.…”

Section: Resultsmentioning

confidence: 99%

Elastic Properties of Poly(ethylene glycol) Nanomembranes and Respective Implications

Zhao

Zharnikov

2022

Membranes

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Free-standing poly(ethylene glycol) (PEG) membranes were prepared from amine- and epoxy-terminated four-arm STAR-PEG precursors in a thickness range of 40–320 nm. The membranes feature high stability and an extreme elasticity, as emphasized by the very low values of Young’s modulus, varying from 2.08 MPa to 2.6 MPa over the studied thickness range. The extreme elasticity of the membranes stems from the elastomer-like character of the PEG network, consisting of the STAR-PEG cores interconnected by crosslinked PEG chains. This elasticity is only slightly affected by a moderate reduction in the interconnections at a deviation from the standard 1:1 composition of the precursors. However, both the elasticity and stability of the membranes are strongly deteriorated by a strong distortion of the network imposed by electron irradiation of the membranes. In contrast, exposure of the membranes to ultraviolet (UV) light (254 nm) does not affect their elastic properties, supporting the assumption that the only effect of such treatment is the decomposition of the PEG material with subsequent desorption of the released fragments. An analysis of the data allowed for the exclusion of so called “hot electrons” as a possible mechanism behind the modification of the PEG membranes by UV light.

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“…[104] IPER also served as an inspiration for an analogous approach utilizing ultraviolet light instead of electrons, which has several advantages, such as applicability in ambient and even liquid environments, but also drawbacks, such as a lower lateral resolution and less broad choice of commercial lithographic setups. [105][106][107][108][109] So far, IPER and IPER-based chemical lithography have been exclusively used for purely scientific purposes, but we envision that this technology will also be recognized and used by the industrial community, resulting in simplified fabrication routes and new nanotechnological products.…”

Section: Discussionmentioning

confidence: 99%

Electron‐Irradiation Promoted Exchange Reaction as a Tool for Surface Engineering and Chemical Lithography

Terfort

Zharnikov

2021

Adv Materials Inter

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tacting solutions, what, for example, is of relevance for the protection of materials from oxidation and degradation. Even more important, this assembly can modify or even redefine completely the chemical, physical, and biological properties of the substrate surface, adapting it to a specific task or an application. Finally, such a supported assembly can be functional on its own, for example, as an element of molecular or organic electronics [4][5][6][7] or a molecular sensor array. [8] A particular advantage of SAMs is the flexibility of their design. The SAMforming molecules consist generally of three major building blocks, videlicet the docking group mentioned above, the terminal tail group building the SAM-ambient interface, and the molecular backbone connecting the docking and tail groups and mediating the self-assembly. [1][2][3] Depending on a particular goal or a specific application, these buildings blocks can be flexibly selected and combined together as well as individually designed, for example, by the introduction of functional groups into the molecular backbone. [9,10] The resulting SAMs can be further modified by physical tools, such as ultra-violet light, electron irradiation, X-rays, and ions. Among these tools, electron irradiation is probably the most versatile one, as it gives the largest flexibility and provides the highest possible lateral resolution. It serves in particular well for tuning SAM properties, [11] fixation of metal films at the SAMambient interface, [12,13] SAM-based lithography and related nanofabrication, [14][15][16][17][18][19][20][21][22][23] as well as preparation of SAM-based carbon nanomembranes (CNMs). [24][25][26][27][28] All these applications rely on the specific effects of electron irradiation on the SAM-forming molecules and the SAMs as a whole. The major irradiationinduced processes include cleavage of individual chemical bonds within the SAM-forming molecules or between the docking groups and the substrate, desorption of the released molecules and their fragments, formation of new chemical groups as a result of reactions between electron-activated moieties, and cross-linking of the molecular fragments. [29][30][31] The occurrence, extent, and rates of the above processes as well as the balance between them depend on the electron energy, identity of the substrate, length of the molecular backbone, and packing density of a SAM but, above all, on the character of the molecular backbone. [31][32][33][34][35] Whereas the scission of nearly all bonds (CH, CC, Self-assembled monolayers (SAMs) can serve as versatile resist/template materials for surface engineering and electron beam lithography (EBL), making possible a new type of lateral patterning: chemical lithography (CL). Whereas CL has been well established for aromatic SAMs, it is hardly possible for aliphatic monolayers, because of extensive irradiation-induced damage excluding selective modification of specific chemical groups. Turning this drawback into an advantage, the irradiation-promoted exchange reactio...

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Controlled Modification of Protein-Repelling Self-Assembled Monolayers by Ultraviolet Light: The Effect of the Wavelength

Cited by 31 publications

References 42 publications

Fouling-Release Properties of Dendritic Polyglycerols against Marine Diatoms

Fouling-Release Properties of Dendritic Polyglycerols against Marine Diatoms

Elastic Properties of Poly(ethylene glycol) Nanomembranes and Respective Implications

Electron‐Irradiation Promoted Exchange Reaction as a Tool for Surface Engineering and Chemical Lithography

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