2013
DOI: 10.1109/tcad.2012.2226454 View full text |Buy / Rent full text
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Abstract: As process technologies advance to the subwavelength era, the 1-D design style is regarded as one of the most effective ways to continue scaling down the minimum feature size. To improve the printability of 1-D cell design, it is essential to insert dummy patterns and optimize line-end gap distribution for each layer. This paper presents novel 1-D cell generation algorithms that simultaneously minimize 1-D cell area and enhance the printability. Experimental results show that the proposed algorithms can effect… Show more

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