Focused ion beam (FIB) milling is a versatile maskless and resistless patterning technique and has been widely used for the fabrication of inverse plasmonic structures such as nanoholes and nanoslits for various applications. However, due to its subtractive milling nature, it is an impractical method to fabricate isolated plasmonic nanoparticles and assemblies which are more commonly adopted in applications. In this work, we propose and demonstrate an approach to reliably and rapidly define plasmonic nanoparticles and their assemblies using FIB milling via a simple "sketch and peel" strategy. Systematic experimental investigations and mechanism studies reveal that the high reliability of this fabrication approach is enabled by a conformally formed sidewall coating due to the ion-milling-induced redeposition. Particularly, we demonstrated that this strategy is also applicable to the state-of-the-art helium ion beam milling technology, with which high-fidelity plasmonic dimers with tiny gaps could be directly and rapidly prototyped. Because the proposed approach enables rapid and reliable patterning of arbitrary plasmonic nanostructures that are not feasible to fabricate via conventional FIB milling process, our work provides the FIB milling technology an additional nanopatterning capability and thus could greatly increase its popularity for utilization in fundamental research and device prototyping.
A plasmonic refractive index (RI) sensor based on metal-insulator-metal (MIM) waveguide coupled with concentric double rings resonator (CDRR) is proposed and investigated numerically. Utilizing the novel supermodes of the CDRR, the FWHM of the resonant wavelength can be modulated, and a sensitivity of 1060 nm/RIU with high figure of merit (FOM) 203.8 is realized in the near-infrared region. The unordinary modes, as well as the influence of structure parameters on the sensing performance, are also discussed. Such plasmonic sensor with simple framework and high optical resolution could be applied to on-chip sensing systems and integrated optical circuits. Besides, the special cases of bio-sensing and triple rings are also discussed.
Adiabatic waveguide taper and on-chip wavelength demultiplexer are the key components of photonic integrated circuits. However, these two kinds of devices which designed by traditional semi-analytic methods or brute-force search methods usually have large size. Here, based on regularized digital metamaterials, we have designed, fabricated and characterized a twochannel focused wavelength demultiplexer with a footprint of 2.4 × 10 μm 2 . The designed demultiplexer can directly connect to a grating coupler under the absence of an adiabatic waveguide taper. The objective first method and modified steepest descent method are used to design the demultiplexer which splits 1520 nm and 1580 nm light from a 10-μm-wide input waveguide into two 0.48-μm-wide output waveguides. Experimental results show that the insertion loss of the upper (lower) channel of the demultiplexer is -1.77 dB (-2.10 dB) and the crosstalk is -25.17 dB (-12.14 dB). Besides, the simulation results indicate that the fabrication tolerance of our devices can reach ±20 nm in etching depth and ±10 nm in plane size changing. Benefit From the extensibility of our design method, we can design other types of ultra-compact 'focused' devices, like mode splitters, mode converters and power splitters, and we can also design devices with more complicated functionalities, for example, we have designed a three-channel focused wavelength demultiplexer.
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