Diamond-like carbon (DLC) films were fabricated by RF CO plasma chemical vapor deposition (CVD) to avoid hydrogen incorporation into the deposited films. Broadband optical emissions confirmed a hydrogen-free process without atomic hydrogen emissions. The fabricated films were characterized by Raman scattering spectroscopy, Rutherford backscattering spectrometry (RBS) with elastic recoil detection analysis (ERDA) methods, and FT-IR spectroscopy with comparison to conventional DLC films fabricated from C 2 H 2 gas. The hydrogen concentration in the DLC films was reduced to 4 at. % using a CO source while the conventional DLC films prepared from C 2 H 2 contained 27 at. %. The DLC films made from CO gas contained a large amount of oxygen, approximately 20 at. %, a larger number of graphite structures than the conventional DLC film, and characteristic triple bonds (C¸C) of carbon atoms in the FT-IR spectrum.
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