The photonics-based approach has recently become a strong candidate for realising a large-scale, practical quantum processor. Particularly in recent years, two-dimensional (2D) materials have become a strong candidate for developing an ideal integrated light source owing to their several unique advantages such as convenient on-chip integration. In this work, we study the effect of strain on the emission wavelength and carrier lifetime. We first show that the geometry of stressors can adjust the amount of strain and emission wavelength. Using this strain engineering technique, we demonstrate that the emission wavelength can be significantly shifted by ~10 nm while the carrier lifetime can also be engineered by ~30 %.
We present a strain engineering platform that allows the dynamic tuning of the emission wavelength of a monolayer WSe2. A large and localized strain was induced in monolayer 2D materials by patterning a photoresist layer with internal stress into two elliptical shapes with a finite gap in between, which is referred to as a dimer in this work. By applying laser annealing on the dimer stressor while monitoring the exciton emission, we demonstrate the capability to dynamically tune the emission wavelength of the bright exciton in the monolayer WSe2.
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