We used scanning tunneling microscopy, low-energy electron diffraction, and Raman spectroscopy to investigate the growth of graphene on 3C-SiC(111)/SiO2/Si(111) surfaces with ion-beam irradiation via the SiC surface decomposition method. We were unable to obtain graphene after annealing the 3C-SiC(111) surface at 1100 °C for 3 min without Ar+ ion-beam irradiation. When a 3C-SiC(111) surface was irradiated with an Ar+ ion beam at an acceleration voltage of 1 keV and an incident angle of 80° and subsequently annealed at 1100 °C for 3 min, graphene formed on the SiC surface. However, when an Ar+ ion beam was used at an incident angle of 70 or 60°, graphene layers were not formed. These results indicate that the breakage of bonds in the surface region of the SiC(111) substrate by ion-beam irradiation promotes the formation of graphene.
We used scanning tunneling microscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy to investigate the influence of ion-beam irradiation on the growth of graphene on 3C-SiC(111) surfaces via the SiC surface decomposition method. When the SiC(111) surface was irradiated with Ar + ions, the surface bonds of the SiC(111) surfaces were broken. After annealing the SiC surface with an Ar + -ion beam at an accelerating voltage of 1 keV and an incident angle of 70• , we obtained graphene with few defects. However, in the case of Ar + -ion-beam irradiation at 60• , the resulting graphene layers exhibited high defect concentrations. We observed that the Si defect and breakage of bonds in the surface region promotes the formation of graphene layers and that the destruction of the deep layers of SiC substrate prevents the growth of graphene.
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