Transition metal oxides have applications into energy storage devices such as electrochemical supercapacitors. We deposited nickel oxide (NiO) thin films using electrodeposition under direct and pulse potentiometry. Effects of the pulse electrodeposition conditions are systematically investigated. Results show that the pulse time clearly influences the morphology of the deposited thin films. The nanostructured thin film that was deposited under 1 sec on-time condition proved to be a suitable electrode material since its 1000 Fg -1 at 0.5 Ag -1 specific capacitance is large enough to fulfil the needed requirement. In addition, the thin film at hand shows 90.1% capacity retention during 800 galvanostatic charge-discharge cycles under 5 Ag −1 current density. Moreover, nanostructured NiO films prepared by pulse electrodeposition demonstrate high power performance, excellent rate as well as long term cycling stability, which make them promising electrode materials for supercapacitor applications.
In this work, the P3HT modified films by incorporation of different amounts of nickel oxide (NiO) were dissolved and deposited by spin-coating method on the indium tin-oxide (ITO) substrates. The nickel oxide powder was synthesized by chronoamperometry method. The effects of NiO content on the morphology structure and optical properties of P3HT films were investigated by means of XRD, SEM, AFM and UV-vis spectroscopy, the electrochemical and photoelectrochemical performance were evaluated by cyclic voltammetry (CV), electrochemical impedance spectroscopy (EIS), galvanostatic charge-discharge tests and photocurrent measurements.The results showed that the NiO dispersed uniformly in P3HT thin films and modified the surface roughness and absorption of thin films after deposition. We observed a remarkable improvement of photocurrent density and electrochemical capacitance of these modified surface electrodes for an amount of NiO ranging between 1 and 10wt%. The obtained specific capacitance for the P3HT material alone is about 20.8 Fg -1 , this value was increased up to 81.4Fg -1 for the composite film P3HT-NiO 10 wt% at 0.1 A/g.
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