The influence of water pressure in the metal–organic deposition (MOD) method on the texture and morphology
of YBa2Cu3O7−X
(YBCO) films grown on buffered metal substrates was investigated. The water pressure was
varied from 4.2% to 10.0%, with the other process parameters, such as annealing temperature
and oxygen pressure, kept constant. In this work, a YBCO precursor solution was prepared
using a fluorine-free Y and Cu precursor solution with the addition of Sm. MOD-YBCO
films were fabricated by continuous slot-die coating and calcination, followed by high
temperature annealing. Using x-ray diffraction analysis, unreacted phase peaks, such as
BaF2
peaks, were found in the samples made at a water pressure of 4.2%; however, the
BaF2
peak intensity was much reduced as the water pressure was increased. The higher water
pressure of about 10.0% in this experiment led to the poor crystallinity of MOD-YBCO
films, possibly due to the fast reaction with the supplied water vapor. Meanwhile, the
morphologies of the YBCO films were not much different from each other in the
range of water pressure of this work. The maximum critical current density of
3.8 MA cm−2
was obtained when the sample was made at the water pressure of 6.2% and the annealing temperature
of 780 °C.
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