Fast growth of macroscaled single-layered
graphene (MSLG)
is crucial
for massive fabrication of graphene with the chemical vapor deposition
(CVD) method. The conventional CVD process of MSLG fabrication is
time-consuming since the dosage rate of carbon precursors such as
methane is usually very low in order to decrease the nucleation density
of graphene grains. A few and even over 10 h are usually needed to
grow graphene grains with a macroscale. Simply increasing the flow
rate of the carbon precursor results in the increase of nucleation
density of graphene grains, which in turn leads to a sharp decrease
of the graphene grain size. Here, we report a modified CVD method
which substantially accelerates the growth rate of graphene without
increasing the nucleation density of graphene grains. Ceramic plates
and defect-rich vertical graphene are used synergistically to assist
the growth of MSLG. The ceramic plate acts as a persistent oxygen
supplement which constrains the nucleation density of graphene grains,
while defect-rich vertical graphene serves as complementary catalysis
which can accelerate the growth speed of graphene grains. Only a few
minutes are needed for the growth of millimeter-sized graphene grains
with this modified CVD method.
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