A method for measuring disjoining pressure of a molecularly thin liquid film on a solid surface by using a microfabricated groove has been developed. The shape of the meniscus of a thin film in the microgroove was measured with an atomic force microscope, and the disjoining pressure was obtained from the capillary pressure obtained from the measured curvature of the meniscus. Our method is applicable to a film with a thickness greater than the diameter of gyration in the polymer molecule. Moreover, the method can detect the changes in the disjoining pressure caused by ultraviolet light irradiation, and it is effective in investigating the intermolecular interaction between a thin film and a solid surface.

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The patterning of liquid thin films on solid surfaces is very important in various fields of science and engineering related to surfaces and interfaces. A method of nanometer-scale patterning of a molecularly thin liquid film on a silicon substrate using the lyophobicity of the oxide nanostructures has recently been reported (Fukuzawa, K.; Deguchi, T.; Kawamura, J.; Mitsuya, Y.; Muramatsu, T.; Zhang, H. Appl. Phys. Lett. 2005, 87, 203108). However, the origin of the lyophobicity of the nanostructure with a height of around 1 nm, which was fabricated by probe oxidation, has not yet been clarified. In the present study, the change in thickness of the liquid film on mesa-shaped nanostructures and the wettability for the various combinations of the thickness of the liquid films and the height of ridge-shaped nanostructures were investigated. These revealed that lyophobicity is caused by a lowering of the intermolecular interaction between the liquid and silicon surfaces by the nanostructure and enables the patterning of a liquid film along it. The tendency of the wettability for a given liquid film and nanostructure size can be predicted by estimating the contributions of the intermolecular interaction and capillary pressure. In this method, the height of the nanostructure can control the wettability. These results can provide a novel method of nanoscale patterning of liquid thin films, which will be very useful in creating new functional surfaces.

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Surface-nanofabrication using probe oxidation is presented. Electrochemically generated oxide nano ridge structures can be fabricated using probes for atomic force microscopy. Moreover, removing the oxide ridge by hydrofluoric acid etching can also produce nanogroove structures. The relationship between the nanostructure shapes and fabrication conditions such as applied voltage and radius of curvature of the probe was investigated. The height of the oxide ridge can be controlled with sub-nanometer accuracy by the applied voltage and the width can be controlled by the tip radius. The depth and width of the groove can be controlled by adjusting the height and width of the ridge. Nanostructures with a very small height or depth (about 50 nm wide and < 1 nm high or deep) can be fabricated by our method. This is very useful for clarifying the nanotribology of micro-or nanomechanical devices.