Due to high Fe4N chemical stability, wear resistance, and BS (saturation magnetic flux density), it shows promise as a magnetic recording medium. The many types of iron nitride, and their properties depend on their preparation. Iron nitrides were prepared by new PV D : electron shower. Nitriding increased with N 2 gas pressure, and the Fe 4 N single phase was obtained at PN z = 7 x 10-3 Torr. BS was high...... 1.1T , but H, (coercive force) low......300e. To increase H, due to shape anisotropy, Fe film was prepared by oblique evaporation, and nitrided by electron shower bombardment in PN2 = 0.01Torr for 420s. The iron film changed to iron nitride film (Fe 4 N + Fe2-3N), Bs was 0.75T and I-I, was 500Oe. Which made the film applicable in magnetic recording media.
Co-Fe-P soft magnetic films for thin film heads were prepared by electroplating.The amorphous phase was obtained at a current density of 5 mA / cm 2 , and the crystal phase at 20mA / cm2 . The values of Bs in the amorphous phase was 1.2T and of He 4 Oe. The value of Bs in the crystal phase was 1.8T and of He 27Oe. Co-Fe-P crystal/amorphous multilayered films were fabricated by pulsating current between 5 and 20mA/cm2. When one layer was about 100-200nm thick, the values of Bs and He were about equal to the mean values of the crystal and amorphous phases.A layer of 10nm thick had excellent soft magnetic properties ; Bs did not decrease (1.6T), but the He was low (6 Oe) and close to that of the amorphous film.
In the presence of a substrate bias (>-100 V), FeN
x
films were prepared at a low
temperature by the electron shower method. The nitride content was increased with increasing
N2 gas pressure and the structure of the films was changed as: Fe →Fe4N →Fe3 →Fe2N.
Multilayer films of (Fe+Fe4N)/(Fe4N+Fe3N) and Fe/Fe3N were prepared on glass and poly
ethylene terephthalate (PET) substrates, respectively, in the presence of a pulse of the substrate
bias. By the pulse of the electron shower, the Fe/Fe4N and Fe/Fe3N multilayer films were
prepared on glass and PET, respectively. When the gas pressure was
increased from 7×10-3 Torr to 11×10-3 Torr, Fe/Fe2N films were prepared on both the substrates. The concentration
(1 at.%) of N in these Fe layers prepared by the pulse of the electron shower was lower than that
(7 at.%) prepared by the pulsed bias. Multilayer films were prepared
from a single vapor source by these methods.
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