In this work, highly ordered TiO2/Ag bilayer structures on p-type silicon
(Si) wafers are prepared by photolithography and electrochemical self-assembly
methods. The interfacial charge transfer (CT) of this Si/TiO2/Ag multistorey structure with a specially aligned work function
is studied. This is important to deduce the interfacial electron migration
behavior of SERS. The three-dimensional finite-difference time-domain
(3D FDTD) simulation is used to explore the combined CT–EM
enhancement mechanism. The result shows that the electron movement
under the CT mechanism can induce the resonance effect of free electrons
to further improve EM performance. In addition, the effect of agglomerated
Ag nanoparticle size distribution on the SERS property and the self-cleaning
property of Si/TiO2/Ag multistorey structures is investigated.
Finally, this unique structure of highly ordered Si/TiO2/Ag SERS substrate shows superior sensitivity, reproducibility, and
stability. Rhodamine 6G (R6G) with trace concentrations as low as
10–15 M can be detected, and the EF is estimated
to be about 8.9 × 1013. The relative standard deviation
(RSD) at 1511 cm–1 is about 4.7%. These results
are very promising for the practical application of the SERS technique
in the rapid trace determination in many fields.
Semiconductor - metal heterostructure is an attractive Surface-Enhanced Raman Scattering (SERS) -active materials, which can boost the performance effectively because of the synergistic contribution of Electromagnetic (EM) and charge transfer...
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