We report on optically excited terahertz (THz) emission by indium nitride (InN) thin films. We have used 70 fs titanium–sapphire laser pulses with wavelengths at 800 nm to generate THz-radiation pulses. The InN thin films are deposited on sapphire substrates with GaN buffer layer by molecular-beam epitaxy. The THz-radiation emitted from the InN surface is significantly stronger than that of the GaN/InN interface. The origin of the THz emission are transient photocarrier currents. These results are in agreement with recent experimental results of InN which show that this material is a small band-gap semiconductor. The magnitude of the THz emission from the InN is strong compared to THz emission from previously investigated semiconductors.
We report femtosecond optically excited terahertz ͑THz͒ emission from tellurium doped GaSb at room temperature. The influence of the majority and minority carrier type and concentrations on the strength of the THz emission is investigated. Strong enhancement of THz emission in GaSb is observed as a result of compensation of native acceptors by tellurium donors. Surface field acceleration and the photo-Dember effect are identified as THz emission mechanisms in GaSb and modeled in dependence of the majority and minority carrier type and concentrations in our GaSb samples. THz emission from p-type GaSb is dominated by the photo-Dember effect whereas THz emission from n-type GaSb is dominated by surface field acceleration. The doping conditions under which THz emission is maximized are identified.
We report femtosecond near-infrared transient photoreflection measurements of native n-type indium nitride and silicon-doped indium nitride thin films. The overall time dependence of the ultrafast reflectivity transient is characterized by the different time scales of carrier cooling and carrier recombination. Experimental analysis demonstrates nonradiative recombination in the picosecond and subpicosecond range as the dominant recombination mechanism at room temperature even at very high carrier concentrations. Silicon-doped InN films exhibit carrier lifetimes as short as 680fs.
We report on millimeter wave electromagnetic radiation from a GaN high electron mobility transistor with the gate length of 1.5 μm at 8 K. The emission takes place at gate and drain voltages in the linear regime of operation but close to the saturation voltage with the principal emission peak at approximately 75 GHz, which is much higher than the device cut-off frequency. An explanation of this effect involves the “shallow water” plasma wave instability, with the frequency of the plasma waves decreased by the ungated regions of the device.
We report an experimental study of femtosecond optically excited emission of terahertz frequency electromagnetic radiation from as-grown n-type InN, silicon doped InN, and magnesium doped InN. We have measured the terahertz emission from these materials as function of dc Hall mobility and carrier concentrations. Terahertz emission from InN:Si and native n-type InN increases with mobility as expected for transient photocurrents as primary mechanism of terahertz emission from InN. InN:Mg exhibits enhanced terahertz emission compared to InN:Si. This is experimental evidence for Mg being electrically active as an acceptor in InN. Terahertz emission from InN:Si is less strong than terahertz emission from native n-type InN because of an increased electron concentration due to silicon being an electrically active donor in InN.
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