Reflection is a natural phenomenon that occurs when light passes the interface between materials with different refractive index. In many applications, such as solar cells or photodetectors, reflection is an unwanted loss process. Many ways to reduce reflection from a substrate have been investigated so far, including dielectric interference coatings, surface texturing, adiabatic index matching and scattering from plasmonic nanoparticles. Here we present an entirely new concept that suppresses the reflection of light from a silicon surface over a broad spectral range. A two-dimensional periodic array of subwavelength silicon nanocylinders designed to possess strongly substrate-coupled Mie resonances yields almost zero total reflectance over the entire spectral range from the ultraviolet to the near-infrared. This new antireflection concept relies on the strong forward scattering that occurs when a scattering structure is placed in close proximity to a high-index substrate with a high optical density of states.

We present a transparent conducting electrode composed of a periodic two-dimensional network of silver nanowires. Networks of Ag nanowires are made with wire diameters of 45-110 nm and a pitch of 500, 700, and 1000 nm. Anomalous optical transmission is observed, with an averaged transmission up to 91% for the best transmitting network and sheet resistances as low as 6.5 Ω/sq for the best conducting network. Our most dilute networks show lower sheet resistance and higher optical transmittance than an 80 nm thick layer of ITO sputtered on glass. By comparing measurements and simulations, we identify four distinct physical phenomena that govern the transmission of light through the networks: all related to the excitation of localized surface plasmons and surface plasmon polaritons on the wires. The insights given in this paper provide the key guidelines for designing high-transmittance and low-resistance nanowire electrodes for optoelectronic devices, including thin-film solar cells. For the latter, we discuss the general design principles to use the nanowire electrodes also as a light trapping scheme.

Plasmonic nanostructures have been recently investigated as a possible way to improve absorption of light in solar cells. The strong interaction of small metal nanostructures with light allows control over the propagation of light at the nanoscale and thus the design of ultrathin solar cells in which light is trapped in the active layer and efficiently absorbed. In this paper we review some of our recent work in the field of plasmonics for improved solar cells. We have investigated two possible ways of integrating metal nanoparticles in a solar cell. First, a layer of Ag nanoparticles that improves the standard antireflection coating used for crystalline and amorphous silicon solar cells has been designed and fabricated. Second, regular and random arrays of metal nanostructures have been designed to couple light in waveguide modes of thin semiconductor layers. Using a large-scale, relative inexpensive nano-imprint technique, we have designed a back-contact light trapping surface for a-Si:H solar cells which show enhanced efficiency over standard randomly textured cells.

Silver nanoparticle arrays placed on top of a high-refractive index substrate enhance the coupling of light into the substrate over a broad spectral range. We perform a systematic numerical and experimental study of the light incoupling by arrays of Ag nanoparticle arrays in order to achieve the best impedance matching between light propagating in air and in the substrate. We identify the parameters that determine the incoupling efficiency, including the effect of Fano resonances in the scattering, interparticle coupling, as well as resonance shifts due to variations in the near-field coupling to the substrate and spacer layer. The optimal configuration studied is a square array of 200 nm wide, 125 nm high spheroidal Ag particles, at a pitch of 450 nm on a 50 nm thick Si(3)N(4) spacer layer on a Si substrate. When integrated over the AM1.5 solar spectral range from 300 to 1100 nm, this particle array shows 50% enhanced incoupling compared to a bare Si wafer, 8% higher than a standard interference antireflection coating. Experimental data show that the enhancement occurs mostly in the spectral range near the Si band gap. This study opens new perspectives for antireflection coating applications in optical devices and for light management in Si solar cells.

We demonstrate an effective nanopatterned antireflection coating on glass that is based on sol-gel chemistry and large-area substrate-conformal soft-imprint technology. The printed 120 nm tall silica nanocylinders with a diameter of 245 nm in a square array with 325 nm pitch form an effective-index (n = 1.20) antireflection coating that reduces the double-sided reflection from a borosilicate glass slide from 7.35% to 0.57% (averaged over the visible spectral range) with a minimum reflectance <0.05% at 590 nm. The nanoglass coating is made using a simple process involving only spin-coating and an imprint step, without vacuum technology or annealing required. The refractive index of the nanoglass layers can be tailored over a broad range by controlling the geometry (1.002 < n < 1.44 in theory), covering a wide range that is not achievable with natural materials. We demonstrate that the nanoglass coating effectively eliminates glare from smart-phone display windows and significantly improves the efficiency of glass-encapsulated solar cells. These features, that are achieved over an angular range as wide as ±50°, together with strong hydrophobicity and mechanical durability, make nanoglass coatings a promising technology to improve the functionality of optoelectronic devices based on glass encapsulation.