A procedure of InAs/InP quantum dots elaboration emitting at 1.55 μm by gas source molecular beam epitaxy is described. It is based on a modification of the capping layer growth which is deposited in two steps, separated by a growth interruption under phosphorus flux. The main effect of this two step capping layer growth is to reduce the height of the biggest islands and thus to decrease the photoluminescence linewidth of the quantum dots emission line. Transmission electron microscopy and photoluminescence experiments show that quantum dots structure are still present after growth interruption under phosphorus flux and that the photoluminescence linewidth at 1.55 μm is reduced from 120 to 50 meV, thanks to this procedure.
Segregation of column III atoms during molecular beam epitaxy of III-III′-V semiconductor compounds causes nonabrupt interfaces and a surface composition different from the bulk one. To derive concentration profiles, a thermodynamical equilibrium model has been used for a long time. This model applies well to describe segregation processes at high growth temperatures, but fails in predicting concentration profile variations with substrate temperature. We have thus developed a kinetic model which correctly takes into account the evolution with the growth temperature. We apply this model to the case of indium segregation in the GaxIn1−xAs/GaAs system. The calculated indium concentration profiles are compared to those obtained with the thermodynamical equilibrium model. A kinetic limitation of segregation is shown to appear at low substrate temperatures and sufficiently high growth rates. This limitation is predicted to arise below 400 °C for a growth rate of 1 monolayer/s for In segregation in the GaxIn1−xAs/GaAs system.
International audienceInAs quantum-dot (QD) laser structures are grown on (113)B-oriented InP substrate by gas-source molecular-beam epitaxy. Following an optimized growth procedure, a high density of 1.1×1011 cm−2 of uniformly sized QDs is achieved. Broad-area lasers containing three stacked QD layers have been realized and tested. Laser emission on the ground-state transition (λ = 1.59 μm) is obtained at room temperature (RT), at a threshold current density as low as 190 A/cm2. Ground-state modal gain and transparency current density is measured to be 7 cm−1 and 23 A/cm2 per dot layer. Ground-state laser emission is also demonstrated from low temperature (100 K, Jth = 33 A/cm2) to high temperature (350 K), exhibiting an insensitive threshold in the [100, 170] K range, and a 55 K characteristic temperature at RT
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