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The behavior of the CH3 radical density in a parallel-plate RF CH4 plasma diluted with rare gases (He, Ne, Ar, Kr, and Xe) was investigated systematically using infrared diode laser absorption spectroscopy. The CH3 radical density increased in CH4/Xe and CH4/Kr plasmas with increasing rare gas dilution. The Xe* atom densities in the lowest metastable state 3 P 2 and the resonant state 3 P 1 were measured in CH4/Xe plasma through absorption spectroscopy using a Xe hollow cathode lamp in order to clarify the role of Xe* (3 P 2 and 3 P 1) atoms. It was shown that the increase in the CH3 radical density in CH4/Xe plasma was mainly caused by the collision of Xe* atoms with CH4 molecules.

Diamond films were successfully synthesized in both parallel-plate radio frequency ͑rf: 13.56 MHz͒ CH 4 and CH 3 OH plasmas with injection of H and OH radicals generated in the remote microwave ͑2.45 GHz͒ H 2 /H 2 O plasma. Effects of H, OH, and CH 3 radicals on the diamond film formation in the rf plasma reactor were investigated by the formation of diamond films employing radical injection technique and the measurement of density in the plasma. Under the condition of diamond film formation, CH 3 density was measured by infrared diode laser absorption spectroscopy ͑IRLAS͒. The kinetics of CH 3 in rf CH 4 and CH 3 OH plasmas with injection of H and OH radicals were evaluated from the results of optical emission spectroscopy and lifetime of CH 3 radicals estimated by IRLAS.

Both anisotropic ablation and thin film formation of polytetrafluoroethylene (PTFE) were successfully demonstrated using synchrotron radiation (SR) irradiation of PTFE, that is, the SR ablation process. Anisotropic ablation by the SR irradiation was performed at an extremely high rate of 3500 µm/min at a PTFE target temperature of 200° C. Moreover, a PTFE thin film was formed at a high rate of 2.6 µm/min using SR ablation of PTFE. The chemical structure of the deposited film was similar to that of the PTFE target as determined from Fourier transform infrared absorption spectroscopy (FT-IR) analysis.

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