This paper discusses in detail the effects of Sub-10nm fin-width (W fin ) on the analog performance and variability of FinFETs. It is observed through detailed measurements that the transconductance degrades and output conductance improves with the reduction in fin-width. Through different analog performance metrics, it is shown that analog circuit performance, in Sub-10nm W fin regime, cannot be improved just by W fin scaling but by optimizing source/drain resistance, gate dielectric thickness together with the W fin scaling. We also explored the effect of process induced total and random variability on trans-conductance and output conductance of FinFETs. A systematic strategy to decouple different variability sources has been discussed and it is shown that mobility, source/drain resistance and oxide thickness are the critical parameters to reduce variability.
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