We report on the morphology of InAs−InSb heterostructured nanowires grown by Au-assisted chemical beam epitaxy. Using scanning and transmission electron microscopy, along with high angle annular dark field image analysis, we show that the hexagons defining the cross section of the two segments of the nanowires are rotated one with respect to the other by 30° around the growth direction and that the corners of these hexagons are rounded off by six small facets. Six additional facets that are not parallel to the growth direction are found in the InSb segment at the InAs−InSb interface and are indexed. Finally, the relation between the dimensions of the two segments composing the nanowires is discussed quantitatively.

Interesting phenomena during the Au-assisted chemical beam epitaxy of InAs-InSb nanowire heterostructures have been observed and interpreted within the framework of a theoretical model. An unusual, non-monotonous diameter dependence of the InSb nanowire growth rate is demonstrated experimentally within a range of deposition conditions. Such a behavior is explained by competition between the Gibbs-Thomson effect and different diffusion-induced material fluxes. Theoretical fits to the experimental data obtained at different flux pressures of In and Sb precursors allow us to deduce some important kinetic coefficients. Furthermore, we discuss why the InAs nanowire stem forms in the wurtzite phase while the upper InSb part has a pure zinc blende crystal structure. It is hypothesized that the 30° angular rotation of nanowire when passing from InAs to the InSb part is driven by the lowest surface energy of (1100) wurtzite and (110) zinc blende facets.

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We report on the low-temperature growth of heavily Si-doped (>1020 cm−3) n+-type GaN by N-rich ammonia molecular beam epitaxy (MBE) with very low bulk resistivity (<4 × 10−4 Ω·cm). This is applied to the realization of regrown ohmic contacts on InAlN/GaN high electron mobility transistors. A low n+-GaN/2 dimensional electron gas contact resistivity of 0.11 Ω·mm is measured, provided an optimized surface preparation procedure, which is shown to be critical. This proves the great potentials of ammonia MBE for the realization of high performance electronic devices.