This work presents the production and characterization of thin films produced by RF Magnetron Sputtering technique for applications as high-k materials. RF co-sputtering was used for deposition of amorphous films on silicon substrates. Targets of 85.5TeO2-14.5ZnO (in wt.%) and bulk gold with purity of 99.99% were RF sputtered. It was developed an appropriate methodology for the nucleation of thin films. The films were characterized by profilometry, transmission electron microscopy (TEM) and electrical measurements to obtain the capacitance curves and determine the dielectric constant (k). By profilometry technique, it was possible to measure the thickness of the thin film and determine the deposition rate. By TEM measurements we verified the presence of metallic nanoparticles and the type of structure formed by the array elements. The film without nanoparticles showed dielectric constant k = 6.5, which enhanced to 10 in the presence of Au nanoparticles in the vitreous matrix.
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