Heterogeneous Ziegler−Natta and homogeneous metallocene catalysts are known to produce ultrahigh molecular weight polyethylene (UHMWPE) in the entangled state. On the other hand, only (two) homogeneous single-site catalysts are reported to yield disentangled UHMWPE (dis-UHMWPE). This disparity between the two types of catalysts and the two states of polyethylene can be bridged if a heterogeneous single-site catalyst that can yield dis-UHMWPE is made accessible. Here, one-pot two-step synthesis of a MgCl 2 supported [Ti(OEt) 4 ] derived catalyst 1 with a two-stage activation strategy is reported to produce dis-UHMWPE. Second activation of catalyst 1 was performed by adding excess modified methylaluminoxane (MMAO12), and XPS analysis indicated that the catalyst existed in only Ti(III) state at [Al]/[Ti] ratio of 600. Catalyst 1 after second activation with MMAO12 was found to be highly active in ethylene polymerization and produced dis-UHMWPE. Polymerization conditions were tailored to obtain molecular weight (M w ) as high as 13 million g/mol PE. To the best of our knowledge, this is the first time a heterogeneous catalyst (catalyst 1) that displays pseudosingle site nature is able to produce dis-UHMWPE. The thus-prepared nascent polyethylene revealed a melting temperature of 141−144 °C, which is a characteristic melting transition for a dis-UHMWPE. The disentangled state of the nascent PE and its M w and MWD were further authenticated by rheological investigations. Isothermal time sweep oscillatory experiments in linear viscoelastic limit revealed a rapid rise in elastic modulus followed by equilibration to plateau modulus, which are characteristic features of the disentangled state. Thus, a pseudo-singlesite heterogeneous catalyst has been accessed, which upon second activation with excess MMAO12 led to the production of dis-UHMWPE.
Understanding how small molecules penetrate and contaminate polymer films is of vital importance for developing protective coatings for a wide range of applications. To this end, we visualize how rhodamine B fluorescent dye diffuses through polystyrene‐polydimethylsiloxane block copolymer coatings using confocal microscopy. The intensity of dye inside the coatings grows and decays non‐monotonically, which is likely due to a combination of dye molecule transport occurring concurrently in different directions. An empirical fitting equation allows us to compare the contamination rates between copolymers, demonstrating that dye penetration is related to the chemical makeup and configuration of the block copolymers. Our work shows that confocal microscopy can be a useful tool to visualize the transport of a fluorophore in space and time through a coating.This article is protected by copyright. All rights reserved
The wetting of polymer melts at high temperatures is studied by placing a glycerol drop on a poly(n-butyl methacrylate) film and measuring the wetting ridge. The height of the wetting...
Variable-pressure electron-beam lithography (VP-EBL) employs an ambient gas at subatmospheric pressures to reduce charging during electron-beam lithography. VP-EBL has been previously shown to eliminate pattern distortion and provide improved resolution when patterning poly(methyl methacrylate) (PMMA) on insulating substrates. However, it remains unknown how water vapor affects the contrast and clearing dose nor has the effect of water vapor on the negative-tone behavior of PMMA been studied. In addition, water vapor has recently been shown to alter the radiation chemistry of the VP-EBL process for Teflon AF. Such changes in radiation chemistry have not been explored for PMMA. In this work, VP-EBL was conducted on conductive substrates to study the effect of water vapor on PMMA patterning separately from the effects of charge dissipation. In addition, both positive and negative-tone processes were studied to determine the effect of water vapor on both chain scission and cross-linking. The contrast of PMMA was found to improve significantly with increasing water vapor pressure for both positive and negative-tone patterning. The clearing dose for positive-tone patterning increases moderately with vapor pressure as would be expected for electron scattering in a gas. However, the onset set dose for negative-tone patterning increased dramatically with pressure revealing a more significant change in the exposure mechanism. X-ray photoelectron spectra and infrared transmission spectra indicate that water vapor only slightly alters the composition of exposed PMMA. Also, electron scattering in water vapor yielded a much larger clear region around negative-tone patterns. This effect could be useful for increasing the range of the developed region around cross-linked PMMA beyond the backscattered electron range. Thus, VP-EBL for PMMA introduces a new means of tuning clearing/onset dose and contrast, while allowing additional control over the size of the cleared region around negative-tone patterns.
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