Electric field-emission from a material of low work function has long been sought as an ideal point electron source to generate a coherent electron beam with high brightness, long service...
Tailoring the elemental doping of inorganic nanowires remains an important challenge due to complex dopant incorporation pathways. Here we report that the face-selectivity of tungstate ions controls growth direction and dopant incorporation of hydrothermal zinc oxide nanowires. The introduction of tungstate ions on nanowire surface during synthesis unexpectedly enhances nucleation at sidewall 10 10 f g planes, while dopant incorporation occurs only on (0001) planes. This conflicting face-selective behavior leads to inhomogeneous dopant distribution. Density functional theory calculations reveal that the face-selective behavior can be interpreted in terms of the effect of coordination structure of the tungstate ions on each zinc oxide crystal plane. In addition, we demonstrate a rational strategy to control the morphology and the elemental doping of tungsten-doped zinc oxide nanowires.
Achieving efficient p-type conduction in Mg-implanted GaN depends largely on postimplantation annealing conditions. Here, we study the effect of postimplantation annealing on the evolution of defects and their interactions with implanted Mg ions by using scanning transmission electron microscopy and atom probe tomography. We found that Mg clusters start to form by annealing the implanted sample above 1000 °C. In addition to the Mg clusters, stacking faults form at an annealing temperature of 1300 °C. The Mg concentrations of about 2–3 orders of magnitude higher than implanted Mg were segregated at the stacking faults. Nanobeam electron diffraction analysis revealed no distinct phase other than GaN formed at the Mg-enriched defects, suggesting that Mg is substituted for Ga in the GaN lattice at the edge of the stacking faults.
Efficient acceptor activation in gallium nitride (GaN) achieved through Mg ion-implantation depends mainly on the concentration of implanted Mg ions and the post-implantation annealing process. In this study, we conducted correlative scanning transmission electron microscopy, atom probe tomography, and cathodoluminescence (CL) measurements on Mg-implanted GaN layers with the implanted concentration ranging from 1 × 10 17 cm −3 to 1 × 10 19 cm −3 . It was found that at the implanted concentration of ∼1 × 10 18 cm −3 , Mg atoms were randomly distributed with defects likely to be vacancy clusters whereas at the implanted concentration of ∼1 × 10 19 cm −3 , Mg-enriched clusters and dislocation loops were formed. From the CL measurements, the donor-acceptor pair (DAP) emissions from the implanted and un-implanted regions are obtained and then compared to analyze Mg activation in these regions. In the sample with Mg ∼1 × 10 19 cm −3 , the existence of Mg-enriched clusters and dislocations in the implanted region leads to a weaker DAP emission, whereas the absence of Mg-enriched clusters and dislocations in the sample with Mg ∼1 × 10 18 cm −3 resulted in a relatively stronger DAP emission.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.