We describe the novel fabrication of a 3D electrical small antenna and its subsequent characterization. The patterning of meander lines conformed onto a hemispherical substrate is achieved by 3D holographic photolithography, which uses time-division multiplexing of a series of iteratively optimized computer-generated holograms. The meander lines have a line width of 100 μm and line separation of 400 μm, with a line pitch of 500 μm and a total meander length of 145 mm. The working frequency is found to be 2.06 GHz, with an efficiency of 46%. This work demonstrates a new method for the fabrication of 3D conformal antennas.

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We describe the patterning of multiple 10 µm wide conductive tracks down the vertical sidewall of a 500 µm thick silicon die. A novel photolithographic technique is used, which utilizes a computer-generated hologram mask in conjunction with a diffraction grating. 3D holographic photolithography is a powerful method for eliminating the troublesome diffractive line broadening that is usually encountered when patterning non-planar substrates. When used in conjunction with a diffraction grating, it creates the possibility to pattern fine features onto vertical surfaces—an achievement outside the normal realm of photolithography. The technique has many potential applications in MEMS, microsystem integration and packaging.

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