Large single-crystal graphene is highly desired and important for the applications of graphene in electronics, as grain boundaries between graphene grains markedly degrade its quality and properties. Here we report the growth of millimetre-sized hexagonal single-crystal graphene and graphene films joined from such grains on Pt by ambient-pressure chemical vapour deposition. We report a bubbling method to transfer these single graphene grains and graphene films to arbitrary substrate, which is nondestructive not only to graphene, but also to the Pt substrates. The Pt substrates can be repeatedly used for graphene growth. The graphene shows high crystal quality with the reported lowest wrinkle height of 0.8 nm and a carrier mobility of greater than 7,100 cm2 V−1 s−1 under ambient conditions. The repeatable growth of graphene with large single-crystal grains on Pt and its nondestructive transfer may enable various applications.

Through molecular engineering, single diarylethenes were covalently sandwiched between graphene electrodes to form stable molecular conduction junctions. Our experimental and theoretical studies of these junctions consistently show and interpret reversible conductance photoswitching at room temperature and stochastic switching between different conductive states at low temperature at a single-molecule level. We demonstrate a fully reversible, two-mode, single-molecule electrical switch with unprecedented levels of accuracy (on/off ratio of ~100), stability (over a year), and reproducibility (46 devices with more than 100 cycles for photoswitching and ~10(5) to 10(6) cycles for stochastic switching).

Graphical AbstractHighlights: We demonstrate chemical vapor deposition of WSe2 and WS2 monolayers, promoted by alkali metal halides, MX (M= Na or K; X=Cl, Br or I).

Near ballistic n-type single-walled carbon nanotube field-effect transistors (SWCNT FETs) have been fabricated with a novel self-aligned gate structure and a channel length of about 120 nm on a SWCNT with a diameter of 1.5 nm. The device shows excellent on- and off-state performance, including high transconductance of up to 25 microS, small subthreshold swing of 100 mV/dec, and gate delay time of 0.86 ps, suggesting that the device can potentially work at THz regime. Quantitative analysis on the electrical characteristics of a long channel device fabricated on the same SWCNT reveals that the SWCNT has a mean-free-path of 191 nm, and the electron mobility of the device reaches 4650 cm(2)/Vs. When benchmarked by the metric CV/ I vs Ion/Ioff, the n-type SWCNT FETs show significantly better off-state leakage than that of the Si-based n-type FETs with similar channel length. An important advantage of this self-aligned gate structure is that any suitable gate materials can be used, and in particular it is shown that the threshold voltage of the self-aligned n-type FETs can be adjusted by selecting gate metals with different work functions.

Transition metal dichalcogenides are relevant for electronic devices owing to their sizable band gaps and absence of dangling bonds on their surfaces. For device development, a controllable method for doping these materials is essential. In this paper, we demonstrate an electrostatic gating method using a solid polymer electrolyte, poly(ethylene oxide) and CsClO4, on exfoliated, multilayer 2H-MoTe2. The electrolyte enables the device to be efficiently reconfigured between n- and p-channel operation with ON/OFF ratios of approximately 5 decades. Sheet carrier densities as high as 1.6 × 10(13) cm(-2) can be achieved because of a large electric double layer capacitance (measured as 4 μF/cm(2)). Further, we show that an in-plane electric field can be used to establish a cation/anion transition region between source and drain, forming a p-n junction in the 2H-MoTe2 channel. This junction is locked in place by decreasing the temperature of the device below the glass transition temperature of the electrolyte. The ideality factor of the p-n junction is 2.3, suggesting that the junction is recombination dominated.