Anti-reflective coatings (ARCs) have evolved into highly effective reflectance and glare reducing components for various optical and opto-electrical equipments. Extensive research in optical and biological reflectance minimization as well as the emergence of nanotechnology over the years has contributed to the enhancement of ARCs in a major way. In this study the prime objective is to give a comprehensive idea of the ARCs right from their inception, as they were originally conceptualized by the pioneers and lay down the basic concepts and strategies adopted to minimize reflectance. The different types of ARCs are also described in greater detail and the state-of-the-art fabrication techniques have been fully illustrated. The inspiration that ARCs derive from nature ('biomimetics') has been an area of major research and is discussed at length. The various materials that have been reportedly used in fabricating the ARCs have also been brought into sharp focus. An account of application of ARCs on solar cells and modules, contemporary research and associated challenges are presented in the end to facilitate a universal understanding of the ARCs and encourage future research.

This review article summarizes the key areas of self-cleaning coatings, primarily focusing on various materials that are widely used in recent research and also in commercial applications. The scope of this article orbits around hydrophobic and hydrophilic coatings, their working mechanism, fabrication techniques that enable the development of such coatings, various functions like Anti-icing, Electrowetting, Surface switchability and the areas where selfcleaning technology can be implemented. Moreover, different characterization techniques and material testing feasibilities are also analyzed and discussed. Though several companies have commercialized a few products based on self-cleaning coating technology, much potential still remains in this field.

Moth's eye inspired multiscale ommatidial arrays offer multifunctional properties of great significance in optoelectronic devices. However, a major challenge remains in fabricating these arrays on large-area substrates using a simple and scalable technique. Here we present the fabrication of these multiscale ommatidial arrays over large areas by a distinct approach called sacrificial layer mediated nanoimprinting, which involves nanoimprinting aided by a sacrificial layer. The fabricated arrays exhibited excellent pattern uniformity over the entire patterned area. Optimum dimensions of the multiscale ommatidial arrays determined by the finite-difference time domain simulations served as the design parameters for replicating the arrays on glass. A broadband suppression of reflectance to a minimum of ∼1.4% and omnidirectional antireflection for highly oblique angles of incidence up to 70° were achieved. In addition, superhydrophobicity and superior antifogging characteristics enabled the retention of optical properties even in wet and humid conditions, suggesting reliable optical performance in practical outdoor conditions. We anticipate that these properties could potentially enhance the performance of optoelectronic devices and minimize the influence of in-service conditions. Additionally, as our technique is solely nanoimprinting-based, it may enable scalable and high-throughput fabrication of multiscale ommatidial arrays.