We report transport measurements on a series of high purity InAs epilayers grown on GaAs substrates by metalorganic chemical vapor deposition using tertiarybutylarsine and trimethylindium. Perfectly specular surfaces were obtained by a two step growth method consisting of a 400 °C prelayer followed by deposition of the thick bulk layer at higher growth temperatures. Temperature dependent Hall measurements between 1.8 and 293 K showed a competition between bulk and surface conduction, with average Hall mobilities of up to 1.2×105 cm2/V s at 50 K. Large changes in the temperature dependent transport data are observed several hours after Hall contact formation and appear to be due to passivation of the surface accumulation layer by native oxide formation.
We characterize a KOH-based ultraviolet (UV) photoassisted wet etching technique using K2S2O8 as the oxidizing agent. The solution provides a well-controlled etch rate and produces smooth high-quality etched surfaces with a minimal degradation in surface roughness as measured by atomic force microscopy. The evolution of the solution pH upon exposure to UV radiation is identified as key to obtaining smooth etched surfaces and a controlled etch rate: Unless steps are taken to maintain the pH above 12.0, the etch rate displays a sharp drop that coincides with a gross roughening of the etched surface. The applicability of the present technique is demonstrated by the fabrication of high-quality mesa-isolated AlGaN/GaN hetrostructure field-effect transistors. In addition, the etch presented here features a high selectivity to C-doped layers which should prove useful in the fabrication of AlGaN/GaN hetrostructure bipolar transistors. The method is well adapted to device processing applications because it does not require connection to the sample to an external electrochemical cell.
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