Efficient infrared light emitters integrated on the mature Si technology platform could lead to on-chip optical interconnects as deemed necessary for future generations of ultrafast processors as well as to nanoanalytical functionality. Toward this goal, we demonstrate the use of GaAs-based nanowires as building blocks for the emission of light with micrometer wavelength that are monolithically integrated on Si substrates. Free-standing (In,Ga)As/GaAs coaxial multishell nanowires were grown catalyst-free on Si(111) by molecular beam epitaxy. The emission properties of single radial quantum wells were studied by cathodoluminescence spectroscopy and correlated with the growth kinetics. Controlling the surface diffusivity of In adatoms along the NW side-walls, we improved the spatial homogeneity of the chemical composition along the nanowire axis and thus obtained a narrow emission spectrum. Finally, we fabricated a light-emitting diode consisting of approximately 10(5) nanowires contacted in parallel through the Si substrate. Room-temperature electroluminescence at 985 nm was demonstrated, proving the great potential of this technology.

The nucleation and growth of InAs nanowires on bare Si(111) has been investigated by molecular beam epitaxy. Nontapered InAs nanowires with high aspect ratio were grown perpendicular to the substrate without the use of catalyst particles, surface oxide, or other substrate mask. The nucleation of InAs takes place in In-rich areas forming spontaneously on the substrate in the beginning of the growth process. As the nucleation proceeds, the local stoichiometry on the growth interface changes from In-rich to As-rich, and the growth continues in a vapor–solid mode. This transition to As-rich conditions is correlated with the evolution of nanowire morphology, that is, with the growth becoming strictly uniaxial and with well-defined vertical sidewalls forming. The diameter, the number density, and the axial growth rate of the nanowires were found to depend exclusively on the surface diffusivity of In adatoms on the substrate.

The realisation of photonic devices for different energy ranges demands materials with different bandgaps, sometimes even within the same device. The optimal solution in terms of integration, device performance and device economics would be a simple material system with widely tunable bandgap and compatible with the mainstream silicon technology. Here, we show that gallium arsenide nanowires grown epitaxially on silicon substrates exhibit a sizeable reduction of their bandgap by up to 40% when overgrown with lattice-mismatched indium gallium arsenide or indium aluminium arsenide shells. Specifically, we demonstrate that the gallium arsenide core sustains unusually large tensile strain with hydrostatic character and its magnitude can be engineered via the composition and the thickness of the shell. The resulted bandgap reduction renders gallium arsenide nanowires suitable for photonic devices across the near-infrared range, including telecom photonics at 1.3 and potentially 1.55 μm, with the additional possibility of monolithic integration in silicon-CMOS chips.

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Two-dimensional arrays of silver nanocylinders fabricated by electron-beam lithography are used to demonstrate plasmon-enhanced near-green light emission from nitride semiconductor quantum wells. Several arrays with different nanoparticle dimensions are employed, designed to yield collective plasmonic resonances in the spectral vicinity of the emission wavelength and at the same time to provide efficient far-field scattering of the emitted surface plasmons. Large enhancements in peak photoluminescence intensity (up to a factor of over 3) are measured, accompanied by a substantial reduction in recombination lifetime indicative of increased internal quantum efficiency. Furthermore, the enhancement factors are found to exhibit a strong dependence on the nanoparticle dimensions, underscoring the importance of geometrical tuning for this application.