Organotin photoresists have shown promise for next-generation lithography because of their high extreme ultraviolet (EUV) absorption cross sections, their radiation sensitive chemistries, and their ability to enable highresolution patterning. To better understand both temperatureand radiation-induced reaction mechanisms, we have studied a model EUV photoresist, which consists of a charge-neutral butyl−tin cluster. Temperature-programmed desorption (TPD) showed very little outgassing of the butyl−tin resist in ultrahigh vacuum and excellent thermal stability of the butyl groups. TPD results indicated that decomposition of the butyl−tin resist was first order with a fairly constant decomposition energy between 2.4 and 3.0 eV, which was determined by butyl group desorption. Electron-stimulated desorption (ESD) showed that butyl groups were the primary decomposition product for electron kinetic energies expected during EUV exposures. X-ray photoelectron spectroscopy was performed before and after low-energy electron exposure to evaluate the compositional and chemical changes in the butyl−tin resists after interaction with radiation. The effect of molecular oxygen during ESD experiments was evaluated, and it was found to enhance butyl group desorption during exposure and resulted in a significant increase in the ESD cross section by over 20%. These results provide mechanistic information that can be applied to organotin EUV photoresists, where a significant increase in photoresist sensitivity may be obtained by varying the ambient conditions during EUV exposures.

Dodecameric (Sn ) and hexameric topologies dominate monoalkyltin-oxo cluster chemistry. Their condensation, triggered by radiation exposure, recently produced unprecedented patterning performance in EUV lithography. A new cluster topology was crystallized from industrial n-BuSnOOH, and additional characterization techniques indicate other clusters are present. Single-crystal X-ray analysis reveals a β-Keggin cluster, which is known but less common than other Keggin isomers in polyoxometalate and polyoxocation chemistry. The structure is formulated [NaO (BuSn) (OH) (O) (OCH ) (Sn(H O) )] (β-NaSn ). SAXS, NMR, and ESI MS differentiate β-NaSn , Sn , and other clusters present in crude "n-BuSnOOH" and highlight the role of Na as a template for alkyltin Keggin clusters. Unlike other alkyltin clusters that are cationic, β-NaSn is neutral. Consequently, it stands as a unique model system, absent of counterions, to study the transformation of clusters to films and nanopatterns.

The Keggin structure is prevalent in nature and synthesis, self-assembled from many metals across the periodic table as both isolated clusters and building blocks of condensed framework oxides. Here we present a one-step synthesis to obtain the sodium-centered butyltin Keggin ion in high yield and high purity, important for mechanistic nanolithography studies. Extensive solution characterization (small-angle X-ray scattering, 1H, 13C and 119Sn nuclear magnetic resonance, electrospray mass spectrometry) also confirms solutions contain only the Na-centered dodecamers. We report three butyltin Keggin structures: the β-isomer (β-NaSn12), the γ-isomer (γ-NaSn12), and a γ-isomer capped with an additional butyltin (γ-NaSn13). All Keggin ions presented here have the general formula [NaO4BuSn12(OCH3)12(O,OH)12] (Bu = butyl), and are of neutral charge. The lack of counterions (OH-) facilitates mechanistic lithographic studies without inference from hydrolysis chemistry. The methanol reaction media enables solubility and ligates the cluster, both important to obtain high purity materials. Despite the monospecific nature of the NaSn12 solutions, NMR reveals both isomer interconversion and ligand exchange. DFT computational comparisons of our three isolated structures, the capped β-isomer (β-NaSn13), along with hypothetical α-isomers (α-NaSn12 and α-NaSn13), showed that the stability ranks β-NaSn12 > γ-NaSn12 > α-NaSn12, consistent with experimental observation. The uncapped isomers were computationally determined to be more stable than the respective capped analogues. These clusters provide a unique opportunity to investigate the lower-symmetry Keggin isomers, and to determine structural factors that control isomer selectivity as well as isomer labilization.