A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul-patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul-patterned stretchable substrate shows great promise for stretchable electronics.

On page 3069, N.‐E. Lee and co‐workers propose a mogul‐patterned stretchable substrate with bumps and valleys, which is inspired from mogul skiing, as a versatile platform for stretchable electronics with improved integrity, stability, and multi‐directional stretchability compared to those with a wavy structure. On the rubber‐like substrate with mogul patterning, ultrathin materials like metals, polymers, and oxides can be formed in a sequence to fabricate functional devices with fewer motion‐induced artifacts.