Figure S1 Scattering maps from antennas on racetrack. a-e, SEM images of top sections of racetracks with different numbers of nanoantennas varying from 1 to 5, respectively. Scale bar in the left one is applicable to the other 4 images. f-j, Dark-field images of the 5 racetracks transmitting suppressed modes with 1 to 5 nanoantennas on their horizontal sections, respectively. k-o, Measured scattering spectra from the 1-to 5-nanoantenna arrays on the racetrack. The arrows in each spectrum denote the wavelengths at which the Dark-field images in f-j were collected. p-t, Calculated far-field patterns projected from 1-to 5-nanoantenna arrays overlapping with standing wave anti-nodes in single straight waveguides and the corresponding near field E y distributions near the antennas.
We present design concepts for optical modulators without using any equalization or bespoke fabrication techniques. The demonstrated silicon photonics transmitter can operate at 100 Gbps OOK, while the power efficiency of the driver is 2.03 pJ/bit.
The field of silicon photonics has experienced widespread adoption in the datacoms industry over the past decade, with a plethora of other applications emerging more recently such as light detection and ranging (LIDAR), sensing, quantum photonics, programmable photonics and artificial intelligence. As a result of this, many commercial complementary metal oxide semiconductor (CMOS) foundries have developed open access silicon photonics process lines, enabling the mass production of silicon photonics systems. On the other side of the spectrum, several research labs, typically within universities, have opened up their facilities for small scale prototyping, commonly exploiting e-beam lithography for wafer patterning. Within this ecosystem, there remains a challenge for early stage researchers to progress their novel and innovate designs from the research lab to the commercial foundries because of the lack of compatibility of the processing technologies (e-beam lithography is not an industry tool). The CORNERSTONE rapid-prototyping capability bridges this gap between research and industry by providing a rapid prototyping fabrication line based on deep-UV lithography to enable seamless scaling up of production volumes, whilst also retaining the ability for device level innovation, crucial for researchers, by offering flexibility in its process flows. This review article presents a summary of the current CORNERSTONE capabilities and an outlook for the future.
Advanced photonic probing techniques are of great importance for the development of non-contact wafer-scale testing of photonic chips. Ultrafast photomodulation has been identified as a powerful new tool capable of remotely mapping photonic devices through a scanning perturbation. Here, we develop photomodulation maps into a quantitative technique through a general and rigorous method based on Lorentz reciprocity that allows the prediction of transmittance perturbation maps for arbitrary linear photonic systems with great accuracy and minimal computational cost. Excellent agreement is obtained between predicted and experimental maps of various optical multimode-interference devices, thereby allowing direct comparison of a device under test with a physical model of an ideal design structure. In addition to constituting a promising route for optical testing in photonics manufacturing, ultrafast perturbation mapping may be used for design optimization of photonic structures with reconfigurable functionalities.
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