A low-cost detection system for laser-induced plasma spectroscopy (LIPS) is described. The system comprises a Rowland spectrometer with photomultiplier detection and a miniaturized multiple gated integrator system. The sensitivity and the spectral band pass of the system were characterized and compared to a conventional Czerny–Turner system with an intensified diode array detector for chromium as representative analyte. Both, the sensitivity and spectral resolution were found to be sufficient for the intended simultaneous multielement LIPS analysis of simple and constant matrices.
Driven by cost saving pressure and new regulations such as REACH, the imple¬mentation of cost efficient, EHS-friendly alternatives is in full swing. There is a clear trend in the plasma etch residue (PER) cleaning field to replace the currently used, expensive and harmful organic PER-removers by EHS-friendly aqueous alternatives. Striking advantages of fluorine free aqueous removal are reported1. The goals of present work -which was carried out in cooperation of BASF and Infineon-, was to examine the dependence of residue constitution on etch and strip conditions and to find a way to adapt also most critical cleaning challenges for EHS-friendly PER remover usage. For that reason a selected aluminum interconnect metal layer with difficult removable residues was chosen. XPS is well proved as an appropriate method for selective sidewall and top/bottom residue analysis2. Our analytical work was focused on defining fingerprints for the etch residues, concerning their elemental distribution, and tracking their changes during the different process steps and conditions.
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