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A novel chemical approach was demonstrated for the growth of high-quality, silver films by CVD. This concept relies on the catalytic reactivity of cationic silver, and of silver surfaces with alcohols. This leads to high-purity films using either state-ofthe-art precursors or silver salts that have not been yet considered as CVD precursors. The occurrence of the catalytic oxidative-dehydrogenation of alcohols, considered as the driving force in this process, was shown by in-situ mass spectrometry (MS). Films of fcc-Ag with q ≤ 2 lX cm were grown without any noticeable contamination. Ag(hfac)COD leads to the growth of a (111) highly orientated film on glass at a rate of 1.66 nm min -1 , while polycrystalline films are grown at a rate of 18.5 nm min -1 using AgNO 3 .

X-ray absorption spectroscopy stud ies of the [MnIllGCrlll)1' single-mo lecu le magnet deposited as a microcrystalline layer on go ld substrates are presented. The oxidation state of the manganese cente rs cha nges from Mnlll to Mn" due to irradiatio n with soft X-rays. The influence of the charge-neutralizing anions on the stability of [MnIll 6Crlll)1' aga inst soft X-ray exposure is investigated for the different a nions tetraphenylborate (BPh 4-), lactate (C3HS0 3-) and perchlorate «(10 4-), The exposure d e pendence of the radiation-induced reduction process is compared for [MnIllGCrlll)1' with the three different anions.