Energy harvesting rectennas require ultrafast rectifying diodes that are efficiently matched to the optical nanoantenna. These diodes should possess low on-resistance and high responsivity. Here, we introduce a metal-insulator-metal diode composed of a new material, Ti-TiO2-Al. This diode has a 1.0 nm ultrathin insulator layer fabricated using atomic layer deposition (ALD). It has a zero-bias resistance of 275 Ω and a maximum responsivity of 3.1 A/W. To further improve its performance, another ultrathin layer of ZnO was added. The proposed Ti-TiO2/ZnO-Al metal-insulator-insulator-metal diode has a zero-bias resistance of 312 Ω and a maximum responsivity of 5.1 A/W. The two types of diodes are fabricated on a SiO2 substrate using conventional photolithography and ALD. Between 20 °C and 55 °C, the I-V characteristics did not show much temperature dependence. The effective barrier height, dielectric constant, and electron effective mass in each insulator are extracted using a constrained and derivative-based optimization algorithm.
A novel yield optimization technique for microwave circuits is presented. Yield optimization of microwave circuits is obstructed by the high expense of EM simulations required in yield evaluations in addition to the absence of any gradient information. In the proposed technique, surrogates using the GSM algorithm are incorporated with a derivative-free TR optimization method NEWUOA. A variance reduction technique is implemented in yield estimation. Practical examples are illustrated.
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